Huawei’s 2022 patent details novel technique to make 2-nm-class chips without EUV tool

South China Morning Post - Dec 4, 2025

Huawei Technologies’ three-year-old patent for advanced patterning comparable with 2-nanometre grade technology without extreme ultraviolet (EUV) lithography tools has intensified speculation about a potential breakthrough in advanced chips. The US-sanctioned company is working to patent a metal integration technique for manufacturing semiconductors, which allows narrow metal structures to be integrated using deep ultraviolet (DUV) technology even for “metal pitches below 21nm”, a feature...

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